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Measurement of thin film interfacial surface roughness by coherence scanning interferometry
Author(s) -
Hirokazu Yoshino,
Ali Abbas,
Piotr M. Kamiński,
Roger Smith,
John M. Walls,
Daniel Mansfield
Publication year - 2017
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4978066
Subject(s) - white light interferometry , optics , thin film , interferometry , materials science , wafer , surface finish , surface roughness , interference (communication) , silicon , optoelectronics , nanotechnology , physics , computer science , composite material , computer network , channel (broadcasting)

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