Gadolinium thin films as benchmark for magneto-caloric thin films
Author(s) -
Lars Helmich,
Marianne Bartke,
Niclas Teichert,
Benjamin Schleicher,
S. Fähler,
Andreas Hütten
Publication year - 2017
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4977880
Subject(s) - curie temperature , materials science , thin film , gadolinium , substrate (aquarium) , magnetization , amorphous solid , tantalum , silicon , curie , sputter deposition , sputtering , wafer , analytical chemistry (journal) , nuclear magnetic resonance , ferromagnetism , condensed matter physics , optoelectronics , metallurgy , nanotechnology , chemistry , crystallography , magnetic field , oceanography , physics , quantum mechanics , chromatography , geology
We report on the preparation of Gadolinium thin films by means of sputter deposition on Silicon Oxide wafers. A series of samples with different buffer layers and various substrate temperatures has been produced. The film on an amorphous Tantalum buffer deposited at 773 K shows the highest increase of magnetization during the phase transition at the Curie temperature. Further detailed analysis of the magnetic properties has been conducted by VSM
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom