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We report on the preparation of Gadolinium thin films by means of sputter deposition on Silicon Oxide wafers. A series of samples with different buffer layers and various substrate temperatures has been produced. The film on an amorphous Tantalum buffer deposited at 773 K shows the highest increase of magnetization during the phase transition at the Curie temperature. Further detailed analysis of the magnetic properties has been conducted by VSM

Gadolinium thin films as benchmark for magneto-caloric thin films