Open AccessFabrication of bit patterned media using templated two-phase growth
Author(s) -
Vignesh Sundar,
XiaoMin Yang,
Yang Liu,
Zhengkun Dai,
Bing Zhou,
Jing Zhu,
Kyung Lee,
Thomas Ming Swi Chang,
David E. Laughlin,
Jian-Gang Zhu
Publication year - 2017
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4974866
Subject(s) - fabrication , materials science , patterned media , nanostructure , lithography , subtractive color , nanotechnology , photolithography , phase (matter) , nanolithography , scaling , optoelectronics , composite material , optics , medicine , grain size , alternative medicine , physics , geometry , pathology , mathematics , chemistry , organic chemistry
In fabricating high areal density magnetic nanostructures for bit patterned magnetic recording media, conventional lithography methods are limited in scaling and often present other challenges, for instance, as etch-damage in case of subtractive schemes. In this paper, we present a novel two-phase growth scheme that enables the fabrication of nanostructures of one material embedded in a matrix of a different material by choosing a separation material that is immiscible with the material of the nanostructure and by designing a template whose material and morphology guides the separation of the two phases and their subsequent growth
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