Formation of SiO2 film by chemical vapor deposition enhanced by atomic species extracted from a surface-wave generated plasma | Zendy

Hiroshi Okada | Zendy; M. Baba | Zendy; M. Furukawa | Zendy; Keisuke Yamane | Zendy; Hiroto Sekiguchi | Zendy; Akihiro Wakahara | Zendy

Open Access

Formation of SiO2 film by chemical vapor deposition enhanced by atomic species extracted from a surface-wave generated plasma

Author(s) -

Hiroshi Okada,

M. Baba,

M. Furukawa,

Keisuke Yamane,

Hiroto Sekiguchi,

Akihiro Wakahara

Publication year - 2017

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.4974788

Subject(s) - x ray photoelectron spectroscopy , chemical vapor deposition , ellipsometry , materials science , stoichiometry , analytical chemistry (journal) , fourier transform infrared spectroscopy , deposition (geology) , refractive index , plasma enhanced chemical vapor deposition , chemical state , chemical bond , infrared , infrared spectroscopy , thin film , chemical engineering , chemistry , nanotechnology , optoelectronics , optics , environmental chemistry , organic chemistry , physics , paleontology , sediment , engineering , biology

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