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Incorporation of Sb and As in MBE grown GaAsxSb1−x layers
Author(s) -
Tobias Zederbauer,
A. M. Andrews,
Don MacFarland,
Hermann Detz,
W. Schrenk,
G. Strasser
Publication year - 2017
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4973216
Subject(s) - materials science , crystal growth , crystal (programming language) , growth rate , chemical engineering , optoelectronics , crystallography , chemistry , computer science , engineering , geometry , mathematics , programming language
With the increasing interest in low effective mass materials for intersubband devices,mixed As-Sb compounds, like GaAsxSb1−x or AlxIn1−xAsySb1−y, gain moreand more attention. The growth of these materials, however, still provides significantchallenges due to the complex interaction between As and Sb. In this work, we provide anin-depth study on the incorporation of Sb into the GaAsxSb1−x layers and compare our findings to thepresent literature on this topic. It is found that both the composition and the crystalquality of GaAsxSb1−x layers are strongly influenced by thegrowthrate due to the As-for-Sb exchangereaction which takes place at the growing surface, andthat high crystal quality can be achieved when the growth is performedunder Sb limited conditions

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