Open AccessReduced energy bandgap of a-Si:H films deposited by PECVD at elevating temperatures
Author(s) -
Yoyok Cahyono,
Umi Maslakah,
Fuad Darul Muttaqin,
Darminto Darminto
Publication year - 2017
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.4973086
Subject(s) - materials science , plasma enhanced chemical vapor deposition , dangling bond , band gap , nanocrystalline material , amorphous solid , chemical vapor deposition , nanocrystalline silicon , silicon , amorphous silicon , optoelectronics , deposition (geology) , analytical chemistry (journal) , nanotechnology , crystalline silicon , crystallography , chemistry , paleontology , chromatography , sediment , biology
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