Open AccessComparison of technologies for nano device prototyping with a special focus on ion beams: A review
Author(s) -
L. Bruchhaus,
Paul Mazarov,
L. Bischoff,
J. Giérak,
Andreas D. Wieck,
H. Hövel
Publication year - 2017
Publication title -
applied physics reviews
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.084
H-Index - 66
ISSN - 1931-9401
DOI - 10.1063/1.4972262
Subject(s) - nanotechnology , focus (optics) , lithography , nano , materials science , focused ion beam , resist , ion beam , electron beam lithography , interface (matter) , computer science , optoelectronics , ion , beam (structure) , optics , chemistry , physics , layer (electronics) , capillary number , capillary action , composite material , organic chemistry
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