Deep ultraviolet emission from ultra-thin GaN/AlN heterostructures
Author(s) -
Dylan Bayerl,
S. M. Islam,
C.M. Jones,
Vladimir Protasenko,
Debdeep Jena,
Emmanouil Kioupakis
Publication year - 2016
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4971968
Subject(s) - exciton , materials science , heterojunction , optoelectronics , monolayer , wide bandgap semiconductor , photoluminescence , ultraviolet , quantum well , excited state , spontaneous emission , luminescence , quantum confined stark effect , quantum dot , band gap , thin film , condensed matter physics , atomic physics , optics , nanotechnology , physics , laser
We present the theoretical and experimental results for the electronic and optical properties of atomically thin (1 and 2 monolayers) GaN quantum wells with AlN barriers. Strong quantum confinement increases the gap of GaN to as high as 5.44 eV and enables light emission in the deep-UV range. Luminescence occurs from the heavy and light hole bands of GaN yielding E ⊥ c polarized light emission. Strong confinement also increases the exciton binding energy up to 230 meV, preventing a thermal dissociation of excitons at room temperature. However, we did not observe excitons experimentally due to high excited free-carrier concentrations. Monolayer-thick GaN wells also exhibit a large electron-hole wave function overlap and negligible Stark shift, which is expected to enhance the radiative recombination efficiency. Our results indicate that atomically thin GaN/AlN heterostructures are promising for efficient deep-UV optoelectronic devices.
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