Physically sound parameterization of incomplete ionization in aluminum-doped silicon
Author(s) -
Heiko Steinkemper,
Pietro P. Altermatt,
Martin Hermle
Publication year - 2016
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4971155
Subject(s) - ionization , silicon , doping , boron , aluminium , formalism (music) , mistake , atomic physics , materials science , physics , optoelectronics , ion , quantum mechanics , metallurgy , nuclear physics , law , musical , art , political science , visual arts
Incomplete ionization is an important issue when modeling silicon devices featuring aluminum-doped p+ (Al-p+) regions. Aluminum has a rather deep state in the band gap compared to boron or phosphorus, causing strong incomplete ionization. In this paper, we considerably improve our recent parameterization [Steinkemper et al., J. Appl. Phys. 117, 074504 (2015)]. On the one hand, we found a fundamental criterion to further reduce the number of free parameters in our fitting procedure. And on the other hand, we address a mistake in the original publication of the incomplete ionization formalism in Altermatt et al., J. Appl. Phys. 100, 113715 (2006)
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom