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Gentle transfer method for water- and acid/alkali-sensitive 2D materials for (S)TEM study
Author(s) -
Junhao Lin,
YungChang Lin,
Xinsheng Wang,
Liming Xie,
Kazu Suenaga
Publication year - 2016
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4967938
Subject(s) - materials science , monolayer , transmission electron microscopy , alkali metal , atomic units , etching (microfabrication) , chemical engineering , atomic force microscopy , characterization (materials science) , nanotechnology , composite material , layer (electronics) , organic chemistry , chemistry , physics , quantum mechanics , engineering
We report a method in making transmission electron microscopy sample for both CVD-grown and exfoliated 2D materials without etching process, thus gentle to those 2D materials that are sensitive to water and reactive etchants. Large-scale WS2 monolayer grown on glass, NbS2 atomic layers grown on exfoliated h-BN flakes, and water-sensitive exfoliated TiS2 flakes are given as representative examples. We show that the as-transferred samples not only retain excellent structural integrity down to atomic scale but also have little oxidations, presumably due to the minimum contact with water/etchants. This method paves the way for atomic scale structural and chemical investigations in sensitive 2D materials

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