Nucleation and growth mechanisms of Al2O3 atomic layer deposition on synthetic polycrystalline MoS2 | Zendy

Haodong Zhang | Zendy; Daniele Chiappe | Zendy; Johan Meersschaut | Zendy; Thierry Conard | Zendy; Alexis Franquet | Zendy; Thomas Nuytten | Zendy; Manuel Mannarino | Zendy; Iuliana Radu | Zendy; Wilfried Vandervorst | Zendy; Annelies Delabie | Zendy

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Nucleation and growth mechanisms of Al2O3 atomic layer deposition on synthetic polycrystalline MoS2

Author(s) -

Haodong Zhang,

Daniele Chiappe,

Johan Meersschaut,

Thierry Conard,

Alexis Franquet,

Thomas Nuytten,

Manuel Mannarino,

Iuliana Radu,

Wilfried Vandervorst,

Annelies Delabie

Publication year - 2016

Publication title -

the journal of chemical physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.071

H-Index - 357

eISSN - 1089-7690

pISSN - 0021-9606

DOI - 10.1063/1.4967406

Subject(s) - nucleation , atomic layer deposition , materials science , crystallite , elastic recoil detection , deposition (geology) , thin film , passivation , chemical engineering , dielectric , nanotechnology , layer (electronics) , analytical chemistry (journal) , chemical physics , crystallography , chemistry , optoelectronics , metallurgy , paleontology , organic chemistry , chromatography , sediment , engineering , biology

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