Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology | Zendy

V. Okhotnikov | Zendy; С.А. Линник | Zendy; A. Gaydaychuk | Zendy

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Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology

Author(s) -

V. Okhotnikov,

С.А. Линник,

A. Gaydaychuk

Publication year - 2016

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.4964566

Subject(s) - reactive ion etching , materials science , scanning electron microscope , argon , diamond , etching (microfabrication) , raman spectroscopy , chemical vapor deposition , analytical chemistry (journal) , glow discharge , crystallite , microstructure , hydrogen , plasma processing , dry etching , plasma , chemistry , composite material , nanotechnology , metallurgy , optics , physics , organic chemistry , layer (electronics) , chromatography , quantum mechanics

The effect of treatment by reactive ion etching in an argon atmosphere, and hydrogen plasma etching in a glow discharge plasma on the surface of the diamond films was investigated. Diamond films were deposited by the Chemical Vapor Deposition method on the hard alloy VK-8 substrates. The crystallites direction under the influence of argon ion beam processing was changed by 45 degrees from the original. The surface morphology becomes more developed (an average value of 20%) by etching in a glow discharge plasma in an atmosphere of hydrogen. Raman spectroscopy, Scanning Electron Microscope and Atomic Force Microscopy were used to determine the phase and microstructure composition of deposited films

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