Open AccessPlasma etching applications in concentrated photovoltaic cell fabrication
Author(s) -
Mathieu de Lafontaine,
Maxime Dar,
Abdelatif Jaouad,
Pierre Albert,
Boussairi Bouzazi,
Clément Colin,
Maïté Volatier,
S. Fafard,
Richard Arès,
Vincent Aimez
Publication year - 2016
Publication title -
aip conference proceedings
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.4962091
Subject(s) - wafer dicing , wafer , optoelectronics , materials science , etching (microfabrication) , plasma etching , fabrication , passivation , solar cell , photovoltaic system , plasma , dry etching , nanotechnology , electrical engineering , layer (electronics) , engineering , medicine , alternative medicine , physics , pathology , quantum mechanics
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