Low resistance Ohmic contact to p-type crystalline silicon via nitrogen-doped copper oxide films | Zendy

Xinyu Zhang | Zendy; Yimao Wan | Zendy; James Bullock | Zendy; Thomas Allen | Zendy; Andrés Cuevas | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Low resistance Ohmic contact to p-type crystalline silicon via nitrogen-doped copper oxide films

Author(s) -

Xinyu Zhang,

Yimao Wan,

James Bullock,

Thomas Allen,

Andrés Cuevas

Publication year - 2016

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.4960529

Subject(s) - ohmic contact , materials science , silicon , x ray photoelectron spectroscopy , raman spectroscopy , substrate (aquarium) , electrical resistivity and conductivity , contact resistance , sputtering , doping , copper , oxide , copper oxide , thin film , chemical engineering , metallurgy , nanotechnology , optoelectronics , optics , layer (electronics) , oceanography , physics , electrical engineering , geology , engineering

This work explores the application of transparent nitrogen doped copper oxide (CuOx:N) films deposited by reactive sputtering to create hole-selective contacts for p-type crystalline silicon (c-Si) solar cells. It is found that CuOx:N sputtered directly onto crystalline silicon is able to form an Ohmic contact. X-ray photoelectron spectroscopy and Raman spectroscopy measurements are used to characterise the structural and physical properties of the CuOx:N films. Both the oxygen flow rate and the substrate temperature during deposition have a significant impact on the film composition, as well as on the resulting contact resistivity. After optimization, a low contact resistivity of ∼10 mΩ cm2 has been established. This result offers significant advantages over conventional contact structures in terms of carrier transport and device fabrication.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research