Open AccessLow energy electron irradiation induced carbon etching: Triggering carbon film reacting with oxygen from SiO2 substrate
Author(s) -
Cheng Chen,
Chao Wang,
Dongfeng Diao
Publication year - 2016
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4960194
Subject(s) - etching (microfabrication) , irradiation , materials science , oxygen , carbon fibers , substrate (aquarium) , electron beam processing , dissociation (chemistry) , fabrication , carbon film , thin film , chemical engineering , isotropic etching , nanotechnology , chemistry , composite material , organic chemistry , alternative medicine , oceanography , pathology , composite number , engineering , layer (electronics) , nuclear physics , medicine , physics , geology
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