Plasma-initiated rehydrogenation of amorphous silicon to increase the temperature processing window of silicon heterojunction solar cells
Author(s) -
Jianwei Shi,
Mathieu Boccard,
Zachary C. Holman
Publication year - 2016
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4958831
Subject(s) - passivation , materials science , silicon , amorphous silicon , wafer , annealing (glass) , optoelectronics , crystalline silicon , heterojunction , solar cell , plasma enhanced chemical vapor deposition , chemical vapor deposition , carrier lifetime , plasma , hydrogen , nanotechnology , chemistry , composite material , layer (electronics) , physics , organic chemistry , quantum mechanics
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