Electric field effect thermoelectric transport in individual silicon and germanium/silicon nanowires
Author(s) -
Yuri M. Brovman,
Joshua P. Small,
Yongjie Hu,
Ying Fang,
Charles M. Lieber,
Philip Kim
Publication year - 2016
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4953818
Subject(s) - materials science , germanium , silicon , nanowire , thermoelectric effect , subthreshold conduction , subthreshold slope , condensed matter physics , optoelectronics , field effect transistor , seebeck coefficient , electrical resistivity and conductivity , doping , saturation (graph theory) , strained silicon , transistor , voltage , electrical engineering , thermal conductivity , crystalline silicon , physics , thermodynamics , mathematics , combinatorics , amorphous silicon , composite material , engineering
We have simultaneously measured conductance and thermoelectric power (TEP) of individual silicon and germanium/silicon core/shell nanowires in the field effect transistor device configuration. As the applied gate voltage changes, the TEP shows distinctly different behaviors while the electrical conductance exhibits the turn-off, subthreshold, and saturation regimes, respectively. At room temperature, peak TEP value of ∼300 μV/K is observed in the subthreshold regime of the Si devices. The temperature dependence of the saturated TEP values is used to estimate the carrier doping of Si nanowires.
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