Open AccessCombined dry plasma etching and online metrology for manufacturing highly focusing x-ray mirrors
Author(s) -
Sébastien Bérujon,
Eric Ziegler,
S. da Cunha,
Florian Bonneau,
R. Baker,
Joël Clément,
Manuel Perez,
S. Thuaudet,
G. Malandrino,
Amparo Vivo,
B. Lantelme,
R. Barrett,
J. Susini
Publication year - 2016
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.4952873
Subject(s) - figuring , metrology , optics , etching (microfabrication) , wafer , surface metrology , process (computing) , surface finish , surface roughness , materials science , computer science , engineering , physics , optoelectronics , mechanical engineering , nanotechnology , profilometer , layer (electronics) , composite material , operating system
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