Erratum: “Charge trapping at the MoS2-SiO2 interface and its effects on the characteristics of MoS2 metal-oxide-semiconductor field effect transistors” [Appl. Phys. Lett. 106, 103109 (2015)]
Author(s) -
Yao Guo,
Xianlong Wei,
Jiapei Shu,
Bo Liu,
Jianbo Yin,
Changrong Guan,
Yuxiang Han,
Song Gao,
Qing Chen
Publication year - 2016
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4952406
Subject(s) - trapping , materials science , field effect transistor , semiconductor , optoelectronics , transistor , interface (matter) , metal , oxide , silicon , charge (physics) , mosfet , engineering physics , nanotechnology , electrical engineering , physics , metallurgy , engineering , ecology , capillary number , voltage , quantum mechanics , capillary action , composite material , biology
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