Enhanced photo/electroluminescence properties of Eu-doped GaN through optimization of the growth temperature and Eu related defect environment
Author(s) -
Wanxin Zhu,
Brandon Mitchell,
Dolf Timmerman,
Akira Uedono,
A. Koizumi,
Y. Fujiwara
Publication year - 2016
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4950826
Subject(s) - materials science , electroluminescence , doping , luminescence , optoelectronics , epitaxy , light emitting diode , ion , vapor phase , analytical chemistry (journal) , nanotechnology , chemistry , layer (electronics) , physics , chromatography , organic chemistry , thermodynamics
The influence of growth temperature on the surface morphology and luminescence properties of Eu-doped GaN layers grown by organometallic vapor phase epitaxy was investigated. By using a Eu source that does not contain oxygen in its molecular structure, and varying the growth temperature, the local defect environment around the Eu3+ ions was manipulated, yielding a higher emission intensity from the Eu3+ ions and a smoother sample surface. The optimal growth temperature was determined to be 960 °C and was used to fabricate a GaN-based red light-emitting diode with a significantly higher output power
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