Ultrafast electron diffraction optimized for studying structural dynamics in thin films and monolayers
Author(s) -
Daniel Badali,
Régis Y. N. Gengler,
R. J. Dwayne Miller
Publication year - 2016
Publication title -
structural dynamics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.415
H-Index - 29
ISSN - 2329-7778
DOI - 10.1063/1.4949538
Subject(s) - diffraction , electron diffraction , picosecond , monolayer , ultrafast electron diffraction , materials science , ultrashort pulse , thin film , reflection high energy electron diffraction , resolution (logic) , electron , optics , optoelectronics , nanotechnology , physics , computer science , laser , artificial intelligence , quantum mechanics
A compact electron source specifically designed for time-resolved diffraction studies of free-standing thin films and monolayers is presented here. The sensitivity to thin samples is achieved by extending the established technique of ultrafast electron diffraction to the “medium” energy regime (1–10 kV). An extremely compact design, in combination with low bunch charges, allows for high quality diffraction in a lensless geometry. The measured and simulated characteristics of the experimental system reveal sub-picosecond temporal resolution, while demonstrating the ability to produce high quality diffraction patterns from atomically thin samples.
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