Transparent ferrimagnetic semiconducting CuCr2O4 thin films by atomic layer deposition | Zendy

T. S. Tripathi | Zendy; C. S. Yadav | Zendy; Maarit Karppinen | Zendy

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Transparent ferrimagnetic semiconducting CuCr2O4 thin films by atomic layer deposition

Author(s) -

T. S. Tripathi,

C. S. Yadav,

Maarit Karppinen

Publication year - 2016

Publication title -

apl materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.571

H-Index - 60

ISSN - 2166-532X

DOI - 10.1063/1.4946884

Subject(s) - atomic layer deposition , ferrimagnetism , materials science , thin film , spinel , band gap , layer (electronics) , deposition (geology) , optoelectronics , analytical chemistry (journal) , chemical engineering , nanotechnology , magnetization , metallurgy , paleontology , chemistry , physics , chromatography , quantum mechanics , sediment , magnetic field , engineering , biology

We report the magnetic and optical properties of CuCr2O4 thin films fabricated by atomic layer deposition (ALD) from Cu(thd)2, Cr(acac)3, and ozone; we deposit 200 nm thick films and anneal them at 700 °C in oxygen atmosphere to crystallize the spinel phase. A ferrimagnetic transition at 140 K and a direct bandgap of 1.36 eV are determined for the films from magnetic and UV-vis spectrophotometric measurements. Electrical transport measurements confirm the p-type semiconducting behavior of the films. As the ALD technique allows the deposition of conformal pin-hole-free coatings on complex 3D surfaces, our CuCr2O4 films are interesting material candidates for various frontier applications

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