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Carrier tuning the metal-insulator transition of epitaxial La0.67Sr0.33MnO3 thin film on Nb doped SrTiO3 substrate
Author(s) -
J. M. Zhan,
P. G. Li,
H. Liu,
Sheng Tao,
He Ma,
Jingqin Shen,
Mingyan Pan,
Zuxian Zhang,
S. L. Wang,
G. L. Yuan
Publication year - 2016
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4945694
Subject(s) - materials science , doping , redistribution (election) , thin film , epitaxy , electric field , metal–insulator transition , condensed matter physics , substrate (aquarium) , optoelectronics , nanotechnology , metal , layer (electronics) , metallurgy , quantum mechanics , politics , political science , oceanography , physics , geology , law
La0.67Sr0.33MnO3 (LSMO) thin films were deposited on (001)SrTiO3(STO) and n-type doped Nb:SrTiO3(NSTO) single crystal substrates respectively. The metal to insulator transition temperature(TMI) of LSMO film on NSTO is lower than that on STO, and the TMI of LSMO can be tuned by changing the applied current in the LSMO/NSTO p-n junction. Such behaviors were considered to be related to the carrier concentration redistribution in LSMO film caused by the change of depletion layer thickness in p-n junction which depends greatly on the applied electric field. The phenomenon could be used to configure artificial devices and exploring the underlying physics

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