Interaction of plasma-generated water cluster ions with chemically-modified Si surfaces investigated by infrared absorption spectroscopy
Author(s) -
Ayumi HiranoIwata,
Ryosuke Matsumura,
Teng Ma,
Yasuo Kimura,
Michio Niwano,
Kazuo Nishikawa
Publication year - 2016
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4944902
Subject(s) - ion , adsorption , infrared spectroscopy , cluster (spacecraft) , absorption (acoustics) , water cluster , ionic bonding , chemistry , spectroscopy , absorption spectroscopy , infrared , analytical chemistry (journal) , molecule , inorganic chemistry , hydrogen bond , materials science , organic chemistry , optics , physics , quantum mechanics , computer science , composite material , programming language
We have investigated the interaction of water cluster ions generated by discharge plasma, with chemically modified Si surfaces using infrared absorption spectroscopy in the multiple internal reflection geometry. We observe that water cluster ions readily adsorb on SiO2-covered Si surfaces to form water droplets. We demonstrate that positively- and negatively-charged cluster ions adsorb on the SiO2-covered Si surface in different manners, indicating ionic interaction of the water droplets with the negatively-charged SiO2 surface. Water droplets formed on the protein-coated surface rupture the amide bond of the proteins, suggesting the function of protein decomposition of water cluster ions
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