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Characterization of MBE-grown InAlN/GaN heterostructure valence band offsets with varying In composition
Author(s) -
Wenyuan Jiao,
Wei Kong,
Jincheng Li,
Kristen Collar,
Tong-Ho Kim,
María Losurdo,
April S. Brown
Publication year - 2016
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4944502
Subject(s) - heterojunction , materials science , x ray photoelectron spectroscopy , molecular beam epitaxy , indium , valence band , wide bandgap semiconductor , optoelectronics , bowing , epitaxy , valence (chemistry) , analytical chemistry (journal) , condensed matter physics , band gap , nanotechnology , chemistry , physics , nuclear magnetic resonance , organic chemistry , layer (electronics) , chromatography , philosophy , theology
Angle-resolved X-ray photoelectron spectroscopy (XPS) is used in this work to experimentally determine the valence band offsets of molecular beam epitaxy (MBE)-grown InAlN/GaN heterostructures with varying indium composition. We find that the internal electric field resulting from polarization must be taken into account when analyzing the XPS data. Valence band offsets of 0.12 eV for In0.18Al0.82N, 0.15 eV for In0.17Al0.83N, and 0.23 eV for In0.098Al0.902N with GaN are obtained. The results show that a compositional-depended bowing parameter is needed in order to estimate the valence band energies of InAlN as a function of composition in relation to those of the binary endpoints, AlN and InN

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