Perspective: Rapid synthesis of complex oxides by combinatorial molecular beam epitaxy
Author(s) -
A. T. Bollinger,
J. Wu,
I. Božović
Publication year - 2016
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4943989
Subject(s) - molecular beam epitaxy , materials science , characterization (materials science) , epitaxy , nanotechnology , oxide , chemical beam epitaxy , thin film , optoelectronics , layer (electronics) , metallurgy
The molecular beam epitaxy (MBE) technique is well known for producing atomically smooth thin films as well as impeccable interfaces in multilayers of many different materials. In particular, molecular beam epitaxy is well suited to the growth of complex oxides, materials that hold promise for many applications. Rapid synthesis and high throughput characterization techniques are needed to tap into that potential most efficiently. We discuss our approach to doing that, leaving behind the traditional one-growth-one-compound scheme and instead implementing combinatorial oxide molecular beam epitaxy in a custom built system
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