Magnetic tunnel junctions with monolayer hexagonal boron nitride tunnel barriers
Author(s) -
Maëlis Piquemal-Banci,
Regina Galceran,
Sabina Caneva,
MarieBlandine Martin,
Robert S. Weatherup,
Piran R. Kidambi,
K. Bouzéhouane,
S. Arockia Edwin Xavier,
A. Anane,
F. Pétroff,
A. Fert,
John Robertson,
Stephan Hofmann,
Bruno Dlubak,
Pierre Sénéor
Publication year - 2016
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4943516
Subject(s) - monolayer , materials science , hexagonal boron nitride , quantum tunnelling , chemical vapor deposition , magnetoresistance , tunnel magnetoresistance , homogeneity (statistics) , condensed matter physics , boron , boron nitride , thin film , nanotechnology , layer (electronics) , optoelectronics , chemistry , magnetic field , statistics , graphene , physics , mathematics , organic chemistry , quantum mechanics
We report on the integration of atomically thin 2D insulating hexagonal boron nitride (h-BN) tunnel barriers into Co/h-BN/Fe magnetic tunnel junctions(MTJs). The h-BN monolayer is directly grown by chemical vapor deposition on Fe. The Conductive Tip Atomic Force Microscopy (CT-AFM) measurements reveal the homogeneity of the tunnel behavior of our h-BN layers. As expected for tunneling, the resistance depends exponentially on the number of h-BN layers. The h-BN monolayer properties are also characterized through integration into complete MTJ devices. A Tunnel Magnetoresistance of up to 6% is observed for a MTJ based on a single atomically thin h-BN layer.
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