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High Ms Fe16N2 thin film with Ag under layer on GaAs substrate
Author(s) -
Xiaowei Zhang,
Yanfeng Jiang,
Meiyin Yang,
Lawrence F. Allard,
JianPing Wang
Publication year - 2016
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4943236
Subject(s) - materials science , x ray photoelectron spectroscopy , annealing (glass) , diffraction , sputtering , substrate (aquarium) , analytical chemistry (journal) , x ray crystallography , lattice constant , layer (electronics) , thin film , crystallography , magnetization , condensed matter physics , nuclear magnetic resonance , composite material , optics , chemistry , nanotechnology , magnetic field , physics , oceanography , chromatography , geology , quantum mechanics
(001) textured Fe16N2 thin film with Ag under layer is successfully grown on GaAs substrate using a facing target sputtering (FTS) system. After post annealing, chemically ordered Fe16N2 phase is formed and detected by X-ray diffraction (XRD). High saturation magnetization (Ms) is measured by a vibrating sample magnetometer (VSM). In comparison with Fe16N2 with Ag under layer on MgO substrate and Fe16N2 with Fe under layer on GaAs substrate, the current layer structure shows a higher Ms value, with a magnetically softer feature in contrast to the above cases. In addition, X-ray photoelectron spectroscopy (XPS) is performed to characterize the binding energy of N atoms. To verify the role of strain that the FeN layer experiences in the above three structures, Grazing Incidence X-ray Diffraction (GIXRD) is conducted to reveal a large in-plane lattice constant due to the in-plane biaxial tensile strain

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