Low leakage ZrO2 based capacitors for sub 20 nm dynamic random access memory technology nodes
Author(s) -
Milan Pešić,
Steve Knebel,
Maximilian Geyer,
Sebastian Schmelzer,
U. Böttger,
Nadiia Kolomiiets,
Valeri Afanas’ev,
Kyuho Cho,
Changhwa Jung,
Jaewan Chang,
Hanjin Lim,
Thomas Mikolajick,
Uwe Schroeder
Publication year - 2016
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4941537
Subject(s) - dram , capacitance , capacitor , dynamic random access memory , leakage (economics) , materials science , stack (abstract data type) , scaling , dielectric , optoelectronics , tin , electronic engineering , electrode , electrical engineering , computer science , voltage , semiconductor memory , engineering , metallurgy , physics , geometry , mathematics , quantum mechanics , economics , macroeconomics , programming language
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