Open AccessPublisher's Note: “Molecular dynamics simulations of Si etching in Cl- and Br-based plasmas: Cl+ and Br+ ion incidence in the presence of Cl and Br neutrals” [J. Appl. Phys. 118, 233304 (2015)]
Author(s) -
Nobuya Nakazaki,
Yoshinori Takao,
Koji Eriguchi,
Kouichi Ono
Publication year - 2016
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4941034
Subject(s) - ion , etching (microfabrication) , plasma , molecular dynamics , plasma etching , atomic physics , incidence (geometry) , chemistry , physics , materials science , computational chemistry , nuclear physics , nanotechnology , optics , organic chemistry , layer (electronics)
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