Venting temperature determines surface chemistry of magnetron sputtered TiN films | Zendy

Grzegorz Greczyński | Zendy; Stanislav Mráz | Zendy; Lars Hultman | Zendy; Jochen M. Schneider | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Venting temperature determines surface chemistry of magnetron sputtered TiN films

Author(s) -

Grzegorz Greczyński,

Stanislav Mráz,

Lars Hultman,

Jochen M. Schneider

Publication year - 2016

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.4940974

Subject(s) - tin , x ray photoelectron spectroscopy , sputter deposition , refractory metals , sputtering , ceramic , cavity magnetron , nitride , materials science , thin film , characterization (materials science) , metallurgy , chemical engineering , chemistry , layer (electronics) , nanotechnology , engineering

Surface properties of refractory ceramic transition metal nitride thin films grown by magnetron sputtering are essential for resistance towards oxidation necessary in all modern applications. Here, typically neglected factors, including exposure to residual process gases following the growth and the venting temperature Tv, each affecting the surface chemistry, are addressed. It is demonstrated for the TiN model materials system that Tv has a substantial effect on the composition and thickness-evolution of the reacted surface layer and should therefore be reported. The phenomena are also shown to have impact on the reliable surface characterization by x-ray photoelectron spectroscopy.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research