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Controlling the carrier lifetime of nearly threading-dislocation-free ZnO homoepitaxial films by 3d transition-metal doping
Author(s) -
Shigefusa F. Chichibu,
Kazunobu Kojima,
Yoshihiro Yamazaki,
K. Furusawa,
Akira Uedono
Publication year - 2016
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4939838
Subject(s) - photoluminescence , doping , materials science , exciton , dislocation , transition metal , vacancy defect , carrier lifetime , recombination , wide bandgap semiconductor , band gap , condensed matter physics , optoelectronics , crystallography , silicon , chemistry , physics , biochemistry , composite material , catalysis , gene
Carrier lifetime in nearly threading-dislocation-free ZnOhomoepitaxial films was controlled by doping 3d transition-metals (TMs), Ni and Mn. The photoluminescence lifetime of the near-band-edge emission (τPL) was decreased linearly by increasing TM concentration, indicating that such TMs are predominant nonradiative recombination centers (NRCs). From this relationship, exciton capture-cross-section () of 2.4 × 10−15 cm2 is obtained. Because of native-NRCs (Zn-vacancy complexes) is likely larger than this value, the linear dependence of the internal quantum efficiency on τPL observed in our TM-doped ZnO and unintentionally dopedZnO in literatures indicates that the concentrations of native-NRCs in the latter are “lower than” 1016–1017 cm−3

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