High dislocation density of tin induced by electric current | Zendy

YiHan Liao | Zendy; Chien-Lung Liang | Zendy; KwangLung Lin | Zendy; Albert T. Wu | Zendy

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High dislocation density of tin induced by electric current

Author(s) -

YiHan Liao,

Chien-Lung Liang,

KwangLung Lin,

Albert T. Wu

Publication year - 2015

Publication title -

aip advances

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.421

H-Index - 58

ISSN - 2158-3226

DOI - 10.1063/1.4937909

Subject(s) - dislocation , materials science , recrystallization (geology) , transmission electron microscopy , tin , crystallography , deflection (physics) , diffraction , current density , condensed matter physics , optics , composite material , metallurgy , chemistry , physics , nanotechnology , paleontology , quantum mechanics , biology

A dislocation density of as high as 1017 /m2 in a tin strip, as revealed by high resolution transmission electron microscope, was induced by current stressing at 6.5 x 103 A/ cm2. The dislocations exist in terms of dislocation line, dislocation loop, and dislocation aggregates. Electron Backscattered Diffraction images reflect that the high dislocation density induced the formation of low deflection angle subgrains, high deflection angle Widmanstätten grains, and recrystallization. The recrystallization gave rise to grain refining

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