Open AccessErratum: “Fabricating a n+-Ge contact with ultralow specific contact resistivity by introducing a PtGe alloy as a contact metal” [Appl. Phys. Lett. 107, 113503 (2015)]
Author(s) -
Chung-Chun Hsu,
Chen-Han Chou,
ShiangYu Wang,
W. C.,
ChiHui Chien,
Guang-Li Luo
Publication year - 2015
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4937124
Subject(s) - electrical resistivity and conductivity , alloy , materials science , metal , contact resistance , electrical contacts , condensed matter physics , metallurgy , composite material , physics , quantum mechanics , layer (electronics)
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