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Plasmon resonance and perfect light absorption in subwavelength trench arrays etched in gallium-doped zinc oxide film
Author(s) -
Joshua R. Hendrickson,
Shivashankar Vangala,
Nima Nader,
Kevin Leedy,
Junpeng Guo,
Justin W. Cleary
Publication year - 2015
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4935219
Subject(s) - materials science , optoelectronics , surface plasmon resonance , plasmon , surface plasmon , localized surface plasmon , optics , gallium , absorption (acoustics) , plasma etching , etching (microfabrication) , nanoparticle , nanotechnology , layer (electronics) , physics , metallurgy , composite material
Near-perfect light absorption in subwavelength trench arrays etched in highly conductive gallium-doped zinc oxide films was experimentally observed in the mid infrared regime. At wavelengths corresponding to the resonant excitation of surface plasmons, up to 99% of impinging light is efficiently trapped and absorbed in the periodic trenches. Scattering cross sectional calculations reveal that each individual trench acts like a vertical split ring resonator with a broad plasmon resonance spectrum. The coupling of these individual plasmon resonators in the grating structure leads to enhanced photon absorption and significant resonant spectral linewidth narrowing. Ellipsometry measurements taken before and after device fabrication result in different permittivity values for the doped zinc oxide material, indicating that localized annealing occurred during the plasma etching process due to surface heating. Simulations, which incorporate a 50 nm annealed region at the zinc oxide surface, are in a good agreement with the experimental results.

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