Discharge current modes of high power impulse magnetron sputtering | Zendy

Zhongzhen Wu | Zendy; Shu Xiao | Zendy; Zhengyong Ma | Zendy; Suihan Cui | Zendy; Shunping Ji | Zendy; Xiubo Tian | Zendy; Ricky K.Y. Fu | Zendy; Paul K. Chu | Zendy; Feng Pan | Zendy

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Discharge current modes of high power impulse magnetron sputtering

Author(s) -

Zhongzhen Wu,

Shu Xiao,

Zhengyong Ma,

Suihan Cui,

Shunping Ji,

Xiubo Tian,

Ricky K.Y. Fu,

Paul K. Chu,

Feng Pan

Publication year - 2015

Publication title -

aip advances

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.421

H-Index - 58

ISSN - 2158-3226

DOI - 10.1063/1.4932135

Subject(s) - high power impulse magnetron sputtering , atomic physics , sputtering , impulse (physics) , ionization , plasma , sputter deposition , ion , materials science , electron , cavity magnetron , voltage , chemistry , physics , thin film , nanotechnology , nuclear physics , organic chemistry , quantum mechanics

Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated

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