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Piezoresponse force microscopy study on ferroelectric polarization of ferroelectric polymer thin films with various structural configurations
Author(s) -
Zongyuan Fu,
Jianchi Zhang,
Junhui Weng,
Weibo Chen,
Yulong Jiang,
Guodong Zhu
Publication year - 2015
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4931998
Subject(s) - ferroelectricity , piezoresponse force microscopy , materials science , polarization (electrochemistry) , non volatile memory , ferroelectric polymers , semiconductor , optoelectronics , thin film , polymer , insulator (electricity) , nanotechnology , composite material , dielectric , chemistry
Ferroelectric polymer-based memory devices have attracted much attention due to their potential in low-cost flexible memories. However, bad retention property of recorded logic states limited their applications. Though mechanisms of retention degradation in ferroelectric memories are complicated and still an open question, depolarization in ferroelectric polymer layer was regarded as the main influencing factor. Here we reported our piezoresponse force microscopy (PFM) study of retention property of polarization states on various ferroelectric polymer based structures. PFM results indicated that, as for ferroelectric/semiconductor structure and ferroelectric/insulator/semiconductor structure with thin insulating layer, both positive and negative polarization states could retain for a relatively long time. Mechanisms of good retention of polarization states were discussed. The discrepancy in bad retention of logic states and good polarization retention of ferroelectric layer was also analyzed

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