Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH | Zendy

Hiroyuki Oguchi | Zendy; Shigehito Isobe | Zendy; Hiroki Kuwano | Zendy; Susumu Shiraki | Zendy; Shinichi Orimo | Zendy; Taro Hitosugi | Zendy

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Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH

Author(s) -

Hiroyuki Oguchi,

Shigehito Isobe,

Hiroki Kuwano,

Susumu Shiraki,

Shinichi Orimo,

Taro Hitosugi

Publication year - 2015

Publication title -

apl materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.571

H-Index - 60

ISSN - 2166-532X

DOI - 10.1063/1.4931080

Subject(s) - materials science , hydride , lithium hydride , pulsed laser deposition , epitaxy , thin film , flatness (cosmology) , substrate (aquarium) , analytical chemistry (journal) , optoelectronics , nanotechnology , ion , layer (electronics) , ionic bonding , metallurgy , metal , chemistry , physics , oceanography , organic chemistry , cosmology , quantum mechanics , chromatography , geology

We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250 °C under a hydrogen pressure of 1.3 × 10−2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm

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