Open AccessPublisher's Note: “Optimal Ge/SiGe nanofin geometries for hole mobility enhancement: Technology limit from atomic simulations” [J. Appl. Phys. 117, 174312 (2015)]
Author(s) -
Ravi Pramod Vedula,
Saumitra Mehrotra,
Tillmann Kubis,
Michael Povolotskyi,
Gerhard Klimeck,
Alejandro Strachan
Publication year - 2015
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4923312
Subject(s) - limit (mathematics) , germanium , electron mobility , condensed matter physics , materials science , physics , optoelectronics , silicon , mathematics , mathematical analysis
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