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Position sensitivity of graphene field effect transistors to X-rays
Author(s) -
Edward Cazalas,
Biddut K. Sarker,
Michael E. Moore,
Isaac Childres,
Yong P. Chen,
Igor Jovanovic
Publication year - 2015
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4921755
Subject(s) - graphene , responsivity , optoelectronics , transistor , materials science , ionizing radiation , field effect transistor , radiation , substrate (aquarium) , physics , nanotechnology , irradiation , voltage , optics , photodetector , quantum mechanics , oceanography , geology , nuclear physics
Device architectures that incorporate graphene to realize detection of electromagnetic radiation typically utilize the direct absorbance of radiation by graphene. This limits their effective area to the size of the graphene and their applicability to lower-energy, less penetrating forms of radiation. In contrast, graphene-based transistor architectures that utilize the field effect as the detection mechanism can be sensitive to interactions of radiation not only with graphene but also with the surrounding substrate. Here, we report the study of the position sensitivity and response of a graphene-based field effect transistor (GFET) to penetrating, well-collimated radiation (micro-beam X-rays), producing ionization in the substrate primarily away from graphene. It is found that responsivity and response speed are strongly dependent on the X-ray beam distance from graphene and the gate voltage applied to the GFET. To develop an understanding of the spatially dependent response, a model is developed that inc...

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