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Negative ion production in the RF multiaperture surface-plasma source
Author(s) -
G.F. Abdrashitov,
Yu. I. Belchenko,
A. Dranichnikov,
А. А. Иванов,
A. Gorbovsky,
V. A. Kapitonov,
V. V. Kolmogorov,
A. A. Kondakov,
S. G. Konstantinov,
A. Sanin,
А. Н. Селиванов,
P. A. Selivanov,
I. V. Shikhovtsev,
O. Sotnikov,
N.V. Stupishin,
M. Tiunov,
Michl Binderbauer,
S. Putvinski,
A. Smirnov,
L. Sevier
Publication year - 2015
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.4916444
Subject(s) - plasma , materials science , aperture (computer memory) , ion beam , ion source , ion , atomic physics , electrode , ion gun , beam (structure) , ion beam deposition , optics , caesium , chemistry , physics , organic chemistry , quantum mechanics , acoustics

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