Open AccessC ion-implanted TiO2 thin film for photocatalytic applications
Author(s) -
G. Impellizzeri,
Viviana Scuderi,
Lucia Romano,
E. Napolitani,
R. Sanz,
R. Carles,
V. Privitera
Publication year - 2015
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4915111
Subject(s) - raman spectroscopy , materials science , photocatalysis , rutherford backscattering spectrometry , doping , titanium dioxide , band gap , visible spectrum , luminescence , ion , thin film , irradiation , mass spectrometry , spectroscopy , analytical chemistry (journal) , optoelectronics , photochemistry , nanotechnology , optics , chemistry , catalysis , biochemistry , organic chemistry , physics , chromatography , quantum mechanics , nuclear physics , metallurgy
Third-generation TiO2 photocatalysts were prepared by implantation of C+ ions into 110 nm thick TiO2 films. An accurate structural investigation was performed by Rutherford backscattering spectrometry, secondary ion mass spectrometry, X-ray diffraction, Raman-luminescence spectroscopy, and UV/VIS optical characterization. The C doping locally modified the TiO2 pure films, lowering the band-gap energy from 3.3 eV to a value of 1.8 eV, making the material sensitive to visible light. The synthesized materials are photocatalytically active in the degradation of organic compounds in water under both UV and visible light irradiation, without the help of any additional thermal treatment. These results increase the understanding of the C-doped titanium dioxide, helpful for future environmental applications. (C) 2015 AIP Publishing LLC
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