Prevention of ion flux lateral inhomogeneities in large area capacitive radio frequency plasmas via the electrical asymmetry effect | Zendy

E Schüngel | Zendy; Sebastian Mohr | Zendy; Julian Schulze | Zendy; Uwe Czarnetzki | Zendy

Open Access

Prevention of ion flux lateral inhomogeneities in large area capacitive radio frequency plasmas via the electrical asymmetry effect

Author(s) -

E Schüngel,

Sebastian Mohr,

Julian Schulze,

Uwe Czarnetzki

Publication year - 2015

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.4907887

Subject(s) - asymmetry , capacitive sensing , ion , plasma , waveform , flux (metallurgy) , materials science , electrode , voltage , debye sheath , phase (matter) , atomic physics , plasma diagnostics , capacitively coupled plasma , radio frequency , physics , computational physics , optics , electrical engineering , inductively coupled plasma , quantum mechanics , metallurgy , engineering

The ion flux is measured spatially resolved along the substrate surface in dual-frequency large area capacitive discharges operated in H2 at 150 Pa. One electrode is driven by 40.68 MHz and/or 81.36 MHz. The dependence of the ion flux profile on the applied voltage waveform is investigated experimentally and by a two-dimensional model. The results show that lateral inhomogeneities caused by standing wave effects can be eliminated based on the electrical asymmetry effect, i.e., by tuning the phase shift between the two applied frequencies. This approach solves one of the major problems in plasma processing of large substrates.

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