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Selective growth of single phase VO2(A, B, and M) polymorph thin films
Author(s) -
Amar Srivastava,
H. Rotella,
Surajit Saha,
Banabir Pal,
K. Gopinadhan,
S. Mathew,
M. Motapothula,
Michal Marcin Dykas,
Ping Yang,
Eiji Okunishi,
D. D. Sarma,
T. Venkatesan
Publication year - 2015
Publication title -
apl materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.571
H-Index - 60
ISSN - 2166-532X
DOI - 10.1063/1.4906880
Subject(s) - materials science , vanadium , phase (matter) , metal–insulator transition , phase diagram , oxygen , thin film , substrate (aquarium) , vanadium dioxide , metal , laser , pulsed laser deposition , analytical chemistry (journal) , crystallography , nanotechnology , optics , metallurgy , chemistry , oceanography , physics , organic chemistry , chromatography , geology
We demonstrate the growth of high quality single phase films of VO2(A, B, and M) on SrTiO3 substrate by controlling the vanadium arrival rate (laser frequency) and oxidation of the V atoms. A phase diagram has been developed (oxygen pressure versus laser frequency) for various phases of VO2 and their electronic properties are investigated. VO2(A) phase is insulating VO2(B) phase is semi-metallic, and VO2(M) phase exhibits a metal-insulator transition, corroborated by photo-electron spectroscopic studies. The ability to control the growth of various polymorphs opens up the possibility for novel (hetero)structures promising new device functionalities

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