z-logo
open-access-imgOpen Access
Continuous electrowetting at the low concentration electrolyte-insulator-semiconductor junction
Author(s) -
S. Arscott
Publication year - 2014
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4903513
Subject(s) - electrowetting , semiconductor , dielectric , electrolyte , materials science , insulator (electricity) , depletion region , doping , intrinsic semiconductor , silicon on insulator , wetting , optoelectronics , space charge , semiconductor device , silicon , analytical chemistry (journal) , nanotechnology , electrode , chemistry , layer (electronics) , physics , composite material , electron , quantum mechanics , chromatography

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom