Empirical determination of the energy band gap narrowing in p+ silicon heavily doped with boron
Author(s) -
Di Yan,
Andrés Cuevas
Publication year - 2014
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4902066
Subject(s) - silicon , doping , boron , materials science , dopant , fermi level , band gap , condensed matter physics , analytical chemistry (journal) , molecular physics , chemistry , physics , optoelectronics , nuclear physics , chromatography , electron
In the analysis of highly doped silicon, energy band gap narrowing (BGN) and degeneracy effects may be accounted for separately, as a net BGN in conjunction with Fermi-Dirac statistics, or lumped together in an apparent BGN used with Boltzmann statistics. This paper presents an experimental study of silicon highly doped with boron, with the aim of evaluating the applicability of previously reported BGN models. Different boron diffusions covering a broad range of dopant densities were prepared, and their characteristic recombination current parameters J0 were measured using a contactless photoconductance technique. The BGN was subsequently extracted by matching theoretical simulations of carrier transport and recombination in each of the boron diffused regions and the measured J0 values. An evaluation of two different minority carrier mobility models indicates that their impact on the extraction of the BGN is relatively small. After considering possible uncertainties, it can be concluded that the BGN is sl...
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