Open AccessVisible-light-induced instability in amorphous metal-oxide based TFTs for transparent electronics
Author(s) -
TaeJun Ha
Publication year - 2014
Publication title -
aip advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.421
H-Index - 58
ISSN - 2158-3226
DOI - 10.1063/1.4899189
Subject(s) - materials science , thin film transistor , optoelectronics , amorphous solid , threshold voltage , gate dielectric , dielectric , hysteresis , oxide , stress (linguistics) , gate oxide , transistor , voltage , condensed matter physics , electrical engineering , nanotechnology , layer (electronics) , chemistry , physics , organic chemistry , linguistics , philosophy , engineering , metallurgy
We investigate the origin of visible-light-induced instability in amorphous metal-oxide based thin film transistors (oxide-TFTs) for transparent electronics by exploring the shift in threshold voltage (Vth). A large hysteresis window in amorphous indium-gallium-zinc-oxide (a-IGZO) TFTs possessing large optical band-gap (≈3 eV) was observed in a visible-light illuminated condition whereas no hysteresis window was shown in a dark measuring condition. We also report the instability caused by photo irradiation and prolonged gate bias stress in oxide-TFTs. Larger Vth shift was observed after photo-induced stress combined with a negative gate bias than the sum of that after only illumination stress and only negative gate bias stress. Such results can be explained by trapped charges at the interface of semiconductor/dielectric and/or in the gate dielectric which play a role in a screen effect on the electric field applied by gate voltage, for which we propose that the localized-states-assisted transitions by visible-light absorption can be responsible
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