Height control of self-assembled quantum dots by strain engineering during capping
Author(s) -
Davide F. Grossi,
Peter Smereka,
J. G. Keizer,
J. M. Ulloa,
P. M. Koenraad
Publication year - 2014
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4897345
Subject(s) - quantum dot , indium , molecular beam epitaxy , materials science , monte carlo method , self assembly , nanotechnology , strain engineering , kinetic energy , condensed matter physics , physics , epitaxy , optoelectronics , layer (electronics) , quantum mechanics , statistics , mathematics , silicon
Strain engineering during the capping of III-V quantum dots has been explored as a means to control the height of strained self-assembled quantum dots. Results of Kinetic Monte Carlo simulations are confronted with cross-sectional Scanning Tunnel Microscopy (STM) measurements performed on InAs quantum dots grown by molecular beam epitaxy. We studied InAs quantum dots that are capped by InxGa(1−x)As layers of different indium compositions. Both from our realistic 3D kinetic Monte Carlo simulations and the X-STM measurements on real samples, a trend in the height of the capped quantum dot is found as a function of the lattice mismatch between the quantum dot material and the capping layer. Results obtained on additional material combinations show a generic role of the elastic energy in the control of the quantum dot morphology by strain engineering during capping.
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