Open AccessSurface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
Author(s) -
JiaLing Yang,
Brianna S. Eller,
R. J. Nemanich
Publication year - 2014
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.4895985
Subject(s) - band bending , materials science , analytical chemistry (journal) , dielectric , atomic layer deposition , gallium nitride , x ray photoelectron spectroscopy , passivation , annealing (glass) , optoelectronics , chemistry , thin film , nanotechnology , layer (electronics) , physics , composite material , chromatography , nuclear magnetic resonance
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