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Effect of antimony on the deep-level traps in GaInNAsSb thin films
Author(s) -
Muhammad Monirul Islam,
Naoya Miyashita,
Nazmul Ahsan,
T. Sakurai,
Katsuhiro Akimoto,
Yoshitaka Okada
Publication year - 2014
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.4895940
Subject(s) - antimony , materials science , optoelectronics , conduction band , deep level transient spectroscopy , band gap , admittance , gallium arsenide , layer (electronics) , wide bandgap semiconductor , electron , silicon , nanotechnology , metallurgy , electrical engineering , electrical impedance , physics , quantum mechanics , engineering
Admittance spectroscopy has been performed to investigate the effect of antimony (Sb) on GaInNAs material in relation to the deep-level defects in this material. Two electron traps, E1 and E2 at an energy level 0.12 and 0.41 eV below the conduction band (E C), respectively, were found in undoped GaInNAs. Bias-voltage dependent admittance confirmed that E1 is an interface-type defect being spatially localized at the GaInNAs/GaAs interface, while E2 is a bulk-type defect located around mid-gap of GaInNAs layer. Introduction of Sb improved the material quality which was evident from the reduction of both the interface and bulk-type defects

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